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Scalable approaches for synthesis and integration of proton selective atomically thin 2D materials with proton conducting polymers can enable next-generation proton exchange membranes with minimal crossover while retaining adequate proton conductance. 

Incorporating atomically thin graphene into proton exchange membranes (PEMs)viascalable and facile processes presents the potential for advancing energy conversion and storage applications while mitigating persistent issues of undesired species crossover. 

Metalorganic chemical vapor deposition (MOCVD) is a promising technique for wafer-scale synthesis of MoS2 monolayers for 2D field-effect transistors (2D-FETs) and related devices. Epitaxial growth of MoS2 on sapphire provides films that are crystallographically well-oriented but typically contain low-angle grain boundaries (e.g., mirror twins), voids, and other defects depending on growth conditions and substrate characteristics. In this study, we investigate microstructure, optical properties, and field-effect characteristics of wafer-scale MoS2 monolayers grown by MOCVD on c-plane sapphire over a narrow window of growth temperatures (900–1000 °C). The density of low-angle grain boundaries in the MoS2 monolayer was found to decrease dramatically from 50% areal coverage for films grown at 900 °C to 5% at 1000 °C. This decrease in low-angle grain boundary density is correlated with an increase in the room-temperature photoluminescence intensity of A excitons and a decrease in the full-width-half maximum (FWHM) of the Raman A1g peak, which are typically indicative of a general reduction in defects in MoS2. However, the best transport properties (e.g., mean field-effect mobility mFE = 17.3 cm2/V s) were obtained in MoS2 monolayers grown at an intermediate temperature of 950 °C. It was found that as the growth temperature increased, small regions bound by high-angle boundaries begin to appear within the monolayer and increase in areal coverage, from ∼2% at 900 °C to ∼5% at 950 °C to ∼10% at 1000 °C. The growth temperature of 950 °C, therefore, provides an intermediate condition where the combined effects of low-angle and high-angle boundaries are minimized. The results of this study provide guidance on MOCVD growth and characterization that can be used to further optimize the performance of MoS2 2D-FETs. 

The epitaxial growth of wafer-scale semiconducting TMDs monolayers (MoS 2 , WS 2 , WSe 2 ) on c-plane sapphire by metalorganic chemical vapor deposition (MOCVD) is demonstrated and the resulting structural and optical properties of the films are compared to elucidate trends based on metal and chalcogen species. The sulfur based TMDs exhibit improved epitaxy, fewer defects and increased photoluminescence intensity on sapphire compared to WSe 2 which is attributed to a smaller effective lattice mismatch and improved stability. 

Movies showing the nucleation of WSe2 on Al2O2 with mixed (Se/O) and single (Se) steps.